Equipment: Suss MA6 Mask Aligner

Features

  • Lithography feature resolution of 1 μm readily achieved while past groups have reported 0.5 μm features
  • Mask holders for 4", 5" and 7" square masks
  • Substrate holders for 1" square substrates up to 6" wafers
  • Substrate thickness up to 0.25" allowed

Description

The Suss MA6 mask aligner provides several modes of contact that can be selected when exposing a photoresist coated wafer to the UV light source. Contact can be light, heavy or vacuum assisted. Additionally the user may expose with no contact at all using special mask holders equipped with precision machined stand-off flags. The 350W lamp provides even illumination with computer controlled intensity modulation to produce reliable exposures.

Location

CNM Cleanroom

FNT 4.106

Fees

$30.00 per hour for UT Austin users

$54.00 per hour for external university users

$65.00 per hour for corporate users

Facility User Education

To become a user of this instrument please sign up for the next available NT201 and NT204 facility user education classes.  External/Corporate users must contact CNM to setup an account before attending facility user education classes.

NT201 Cleanroom Safety Fee: $27.00

NT204 Photolithography Fee: $84.00

Contact

Dr. Damon Smith

damonsmith@austin.utexas.edu

(512) 232-3695